Industries — Semiconductor

Semiconductor.
Precision power for fabrication and test equipment.

High-frequency, ultra-low-ripple power supplies for semiconductor fabrication equipment — plasma generators, ion implanters, CVD reactors, and ATE systems. Based on the founder's experience designing 2–20 kW plasma power supplies at 25–100 kHz at ITW.

20 kW
Power Range
100 kHz
Switching Frequency
10+
Products Delivered
Unity PF
Power Factor
The Problem

Semiconductor fabs demand
the most precise power electronics built.

Semiconductor fabrication equipment is among the most demanding power electronics application in existence. Plasma generators require precise frequency control, fast arc extinction, and sub-microsecond response. CVD reactors demand ultra-low ripple. ATE systems require ultra-fast settling. These requirements cannot be met with general-purpose power supplies. Power Flux AI has direct experience — the founder designed and delivered 10+ plasma power supply products at ITW on a modular reuse platform.

"At ITW, we launched 10+ plasma power supply products on a single modular platform — unity power factor, 110–575 VAC global input range, 2–20 kW at 25–100 kHz. That platform architecture is the direct precursor to the AI-native modular platform Power Flux AI is building today."

Solutions

Purpose-built for
this industry.

Plasma

Plasma Power Supplies

2–20 kW RF and pulsed DC plasma power supplies for CVD, PVD, etch, and surface treatment. Fast arc extinction, precise frequency control, and impedance matching. Based on proven ITW platform architecture.

2–20 kW25–100 kHzArc ExtinctionImpedance Matching
Ion Implant

Ion Implanter Power Supplies

High-voltage, high-stability power supplies for ion implantation systems. Ultra-low ripple, precise current control, and fast settling time for implant dose accuracy.

High-VoltageUltra-Low RippleDose AccuracyFast Settling
CVD / ALD

Process Reactor Power

Precision power supplies for chemical vapor deposition (CVD) and atomic layer deposition (ALD) reactors. Ultra-stable output for uniform film deposition. Modular architecture for multi-zone control.

CVD / ALDMulti-ZoneUltra-StableModular
ATE

Automated Test Equipment Power

High-efficiency, low-EMI power systems for automated test equipment. Fast settling, wide output range, and programmable via SCPI over LAN/USB. IEC 61010 compliant.

ATESCPILow EMIIEC 61010
PFC

Unity Power Factor Front End

Global input range 110–575 VAC, unity power factor, THD <5%. Modular platform with plug-in power stages for 1–20 kW output range. IEEE 519 and IEC 61000-3-12 compliant.

Unity PF110–575 VACModularIEEE 519
Platform

Modular Product Platform

Single modular power platform with plug-in power stages, shared control board, and common mechanical chassis. Enables 10+ product variants from one design — the proven ITW methodology applied with AI acceleration.

Modular Platform10+ VariantsShared ControlNRE Reduction
Services Applied

What we deliver.

Plasma Power Supply Development
2–20 kW RF and pulsed DC plasma power supplies. Based on proven ITW platform architecture. Fast arc extinction and impedance matching.
Precision DC Power Supplies
Ultra-low ripple, high-stability DC power supplies for CVD, ALD, and ion implant applications.
ATE Power Systems
Low-EMI, fast-settling power systems for automated test equipment with SCPI programmability.
Modular Power Platform
Single modular platform enabling multiple product variants from one design — reducing NRE cost per product significantly.
IEEE 519 & PFC Front End
Unity power factor, global input range front end for all semiconductor power equipment.

Precision power for your fab.

Start with an Architecture Sprint — evaluation of your fabrication equipment power requirements, proposed platform architecture, and development roadmap.